文献
J-GLOBAL ID:201702210409996051
整理番号:17A0443959
誘導結合プラズマによって支援された高周波スパッタリングによる非晶質窒化けい素薄膜の作製【Powered by NICT】
Fabrication of amorphous silicon nitride thin films by radio-frequency sputtering assisted by an inductively coupled plasma
著者 (5件):
Ishii Yuki
(Course of Electrical and Electronic System, Graduate School of Engineering, Tokai University, 4-1-1 Kitakaname, Hiratsuka, Kanagawa 259-1292, Japan)
,
Kaneko Tetsuya
(Course of Electrical and Electronic System, Graduate School of Engineering, Tokai University, 4-1-1 Kitakaname, Hiratsuka, Kanagawa 259-1292, Japan)
,
Okimura Kunio
(Course of Electrical and Electronic System, Graduate School of Engineering, Tokai University, 4-1-1 Kitakaname, Hiratsuka, Kanagawa 259-1292, Japan)
,
Shindo Haruo
(Course of Electrical and Electronic System, Graduate School of Engineering, Tokai University, 4-1-1 Kitakaname, Hiratsuka, Kanagawa 259-1292, Japan)
,
Isomura Masao
(Course of Electrical and Electronic System, Graduate School of Engineering, Tokai University, 4-1-1 Kitakaname, Hiratsuka, Kanagawa 259-1292, Japan)
資料名:
Thin Solid Films
(Thin Solid Films)
巻:
624
ページ:
49-53
発行年:
2017年
JST資料番号:
B0899A
ISSN:
0040-6090
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)