文献
J-GLOBAL ID:201702210457255912
整理番号:17A0747657
トリフルオロメチル基を含む超低誘電率多孔性ポリイミド膜の合成と性質【Powered by NICT】
Synthesis and properties of ultralow dielectric constant porous polyimide films containing trifluoromethyl groups
著者 (6件):
Li Jianwei
(MOE Key Laboratory of Applied Physics and Chemistry in Space, Department of Applied Chemistry School of Science, Northwestern Polytechnical University, Xi’an, 710072, China)
,
Zhang Guangcheng
(MOE Key Laboratory of Applied Physics and Chemistry in Space, Department of Applied Chemistry School of Science, Northwestern Polytechnical University, Xi’an, 710072, China)
,
Zhu Qi
(MOE Key Laboratory of Applied Physics and Chemistry in Space, Department of Applied Chemistry School of Science, Northwestern Polytechnical University, Xi’an, 710072, China)
,
Li Jiantong
(MOE Key Laboratory of Applied Physics and Chemistry in Space, Department of Applied Chemistry School of Science, Northwestern Polytechnical University, Xi’an, 710072, China)
,
Zhang Hongming
(MOE Key Laboratory of Applied Physics and Chemistry in Space, Department of Applied Chemistry School of Science, Northwestern Polytechnical University, Xi’an, 710072, China)
,
Jing Zhanxin
(MOE Key Laboratory of Applied Physics and Chemistry in Space, Department of Applied Chemistry School of Science, Northwestern Polytechnical University, Xi’an, 710072, China)
資料名:
Journal of Applied Polymer Science
(Journal of Applied Polymer Science)
巻:
134
号:
8
ページ:
ROMBUNNO.44494
発行年:
2017年
JST資料番号:
C0467A
ISSN:
0021-8995
CODEN:
JAPNAB
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)