文献
J-GLOBAL ID:201702213554900331
整理番号:17A0193634
ナノインプリントリソグラフィーのSiスタンプにおける疎水性シラン被覆の役割
The role of hydrophobic silane coating on Si stamps in nanoimprint lithography
著者 (6件):
Amirsadeghi Alborz
(Mechanical Engineering Department and Center of Bio-Modular and Multi-scale Systems, Louisiana State University, Baton Rouge, Louisiana 70803, USA)
,
Brumfield Lance
(Mechanical Engineering Department and Center of Bio-Modular and Multi-scale Systems, Louisiana State University, Baton Rouge, Louisiana 70803, USA)
,
Choi Junseo
(Mechanical Engineering Department and Center of Bio-Modular and Multi-scale Systems, Louisiana State University, Baton Rouge, Louisiana 70803, USA)
,
Brown Emily
(Mechanical Engineering Department and Center of Bio-Modular and Multi-scale Systems, Louisiana State University, Baton Rouge, Louisiana 70803, USA)
,
Lee Jae Jong
(Nano-Mechanical Systems Research Division, Korea Institute of Machinery and Materials, 104 Sinseongno, Yuseong-Gu, Daejeon 305-343, South Korea)
,
Park Sunggook
(Mechanical Engineering Department and Center of Bio-Modular and Multi-scale Systems, Louisiana State University, Baton Rouge, Louisiana 70803, USA)
資料名:
Journal of Applied Physics
(Journal of Applied Physics)
巻:
121
号:
4
ページ:
044909-044909-7
発行年:
2017年01月28日
JST資料番号:
C0266A
ISSN:
0021-8979
CODEN:
JAPIAU
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)