文献
J-GLOBAL ID:201702214884817691
整理番号:17A1480472
多結晶グラフェンと非晶質SiO_2基板との間の熱境界抵抗【Powered by NICT】
Thermal boundary resistance between the polycrystalline graphene and the amorphous SiO2 substrate
著者 (4件):
Li Ting
(Faculty of Electronic Information and Electrical Engineering, Key Lab. of Liaoning for Integrated Circuits Technology, Dalian University of Technology, Dalian 116024, China)
,
Tang Zhenan
(Faculty of Electronic Information and Electrical Engineering, Key Lab. of Liaoning for Integrated Circuits Technology, Dalian University of Technology, Dalian 116024, China)
,
Huang Zhengxing
(Faculty of Electronic Information and Electrical Engineering, Key Lab. of Liaoning for Integrated Circuits Technology, Dalian University of Technology, Dalian 116024, China)
,
Yu Jun
(Faculty of Electronic Information and Electrical Engineering, Key Lab. of Liaoning for Integrated Circuits Technology, Dalian University of Technology, Dalian 116024, China)
資料名:
Chemical Physics Letters
(Chemical Physics Letters)
巻:
685
ページ:
349-353
発行年:
2017年
JST資料番号:
B0824A
ISSN:
0009-2614
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)