文献
J-GLOBAL ID:201702216079834060
整理番号:17A0399043
高性能スーパーキャパシタ応用のための六方晶系WO_3薄膜の温度に依存した表面形態変化【Powered by NICT】
Temperature dependent surface morphological modifications of hexagonal WO3 thin films for high performance supercapacitor application
著者 (6件):
Shinde Pragati A.
(Thin Film Physics Laboratory, Department of Physics, Shivaji University Kolhapur, 416 004 M.S., India)
,
Lokhande Abhishek C.
(Department of Materials Science and Engineering, Chonnam National University, 300 Yongbong-Dong, Puk-Gu, Gwangju 500-757, South Korea)
,
Chodankar Nilesh R.
(School of Applied Chemical Engineering and Research Institute for Catalysis, Chonnam National University, Gwangju 500-757, South Korea)
,
Patil Amar M.
(Thin Film Physics Laboratory, Department of Physics, Shivaji University Kolhapur, 416 004 M.S., India)
,
Kim Jin H.
(Department of Materials Science and Engineering, Chonnam National University, 300 Yongbong-Dong, Puk-Gu, Gwangju 500-757, South Korea)
,
Lokhande Chandrakant D.
(Centre for Interdisciplinary Research, D. Y. Patil University, Kolhapur, 416 006 M.S., India)
資料名:
Electrochimica Acta
(Electrochimica Acta)
巻:
224
ページ:
397-404
発行年:
2017年
JST資料番号:
B0535B
ISSN:
0013-4686
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
イギリス (GBR)
言語:
英語 (EN)