文献
J-GLOBAL ID:201702216239649029
整理番号:17A0759243
分裂活性層による柔軟な酸化物薄膜トランジスタの界面工学【Powered by NICT】
Top Interface Engineering of Flexible Oxide Thin-Film Transistors by Splitting Active Layer
著者 (3件):
Lee Suhui
(Advanced Display Research Center (ADRC), Department of Information Display, Kyung Hee University, 26 Kyungheedae-ro, Dongdaemun-gu, Seoul, 02447, South Korea)
,
Shin Jiyeong
(Advanced Display Research Center (ADRC), Department of Information Display, Kyung Hee University, 26 Kyungheedae-ro, Dongdaemun-gu, Seoul, 02447, South Korea)
,
Jang Jin
(Advanced Display Research Center (ADRC), Department of Information Display, Kyung Hee University, 26 Kyungheedae-ro, Dongdaemun-gu, Seoul, 02447, South Korea)
資料名:
Advanced Functional Materials
(Advanced Functional Materials)
巻:
27
号:
11
ページ:
ROMBUNNO.201604921
発行年:
2017年
JST資料番号:
W1336A
ISSN:
1616-301X
CODEN:
AFMDC6
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
ドイツ (DEU)
言語:
英語 (EN)