文献
J-GLOBAL ID:201702216453306743
整理番号:17A1623884
蒸発によるSiO_2厚さ分布の変化【Powered by NICT】
Modification of SiO2 thickness distribution through evaporation
著者 (3件):
Zhang Xiumei
(Engineering Research Center of IoT Technology Applications (Ministry of Education), Department of Electronic Engineering, Jiangnan University, Wuxi 214122, China)
,
Gu Xiaofeng
(Engineering Research Center of IoT Technology Applications (Ministry of Education), Department of Electronic Engineering, Jiangnan University, Wuxi 214122, China)
,
Xiao Shaoqing
(Engineering Research Center of IoT Technology Applications (Ministry of Education), Department of Electronic Engineering, Jiangnan University, Wuxi 214122, China)
資料名:
Thin Solid Films
(Thin Solid Films)
巻:
642
ページ:
31-35
発行年:
2017年
JST資料番号:
B0899A
ISSN:
0040-6090
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)