文献
J-GLOBAL ID:201702216770886179
整理番号:17A0965781
14nm金属ゲート膜はスタック開発と挑戦【Powered by NICT】
14nm metal gate film stack development and challenges
著者 (6件):
Jianhua Xu
(Semiconductor Manufacturing International Corporation (SMIC), 18, Zhangjiang Road, Pudong New Area, 201203, China)
,
Anni Wang
(SMIC Advanced Technology R&D (Shanghai) Corporation, 18, Zhangjiang Road, Pudong New Area, 201203, China)
,
Jun He
(SMIC Advanced Technology R&D (Shanghai) Corporation, 18, Zhangjiang Road, Pudong New Area, 201203, China)
,
Xuezhen Jing
(Semiconductor Manufacturing International Corporation (SMIC), 18, Zhangjiang Road, Pudong New Area, 201203, China)
,
Ziying Zhang
(SMIC Advanced Technology R&D (Shanghai) Corporation, 18, Zhangjiang Road, Pudong New Area, 201203, China)
,
Beichao Zhang
(SMIC Advanced Technology R&D (Shanghai) Corporation, 18, Zhangjiang Road, Pudong New Area, 201203, China)
資料名:
IEEE Conference Proceedings
(IEEE Conference Proceedings)
巻:
2017
号:
CSTIC
ページ:
1-3
発行年:
2017年
JST資料番号:
W2441A
資料種別:
会議録 (C)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)