文献
J-GLOBAL ID:201702216940590193
整理番号:17A0882688
高単分散CeO_2@poly(メチルシルセスキオキサン)ミクロスフェアの作製と紫外線遮蔽膜への応用【Powered by NICT】
Fabrication of highly monodisperse CeO2@poly(methyl silsesquioxane) microspheres and their application in UV-shielding films
著者 (3件):
Yuan Jinfang
(School of Materials Science and Engineering, South China University of Technology, 381 Wushan Road, Guangzhou, 510640, People’s Republic of China)
,
Ma Wenshi
(School of Materials Science and Engineering, South China University of Technology, 381 Wushan Road, Guangzhou, 510640, People’s Republic of China)
,
Mo Jinpeng
(School of Materials Science and Engineering, South China University of Technology, 381 Wushan Road, Guangzhou, 510640, People’s Republic of China)
資料名:
Journal of Applied Polymer Science
(Journal of Applied Polymer Science)
巻:
134
号:
29
ページ:
ROMBUNNO.45065
発行年:
2017年
JST資料番号:
C0467A
ISSN:
0021-8995
CODEN:
JAPNAB
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)