文献
J-GLOBAL ID:201702218242580568
整理番号:17A1092049
分子水素曝露により作製した水素化ステップのあるSi(111)表面の和周波数発生分光法による研究【Powered by NICT】
Sum frequency generation spectroscopy study of hydrogenated stepped Si(111) surfaces made by molecular hydrogen exposure
著者 (5件):
Hien K.T.T.
(School of Materials Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan)
,
Sattar M.A.
(School of Materials Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan)
,
Miyauchi Y.
(Department of Physics, National Academy of Japan, Hashirimizu 1-10-20, Yokosuka, Kanagawa 239-8686, Japan)
,
Mizutani G.
(School of Materials Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan)
,
Rutt H.N.
(School of Electronics and Computer Science, University of Southampton, Southampton SO17 1BJ, U.K)
資料名:
Surface Science
(Surface Science)
巻:
663
ページ:
11-15
発行年:
2017年
JST資料番号:
C0129B
ISSN:
0039-6028
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)