文献
J-GLOBAL ID:201702219865539764
整理番号:17A0400984
Li_3NbO_4エピタキシャル膜中に埋込まれた低高さ/幅アスペクト比Li_3Ni_2NbO_6ディスクの自己集合【Powered by NICT】
Self-assembly of very-low height/width aspect-ratio Li3Ni2NbO6 disks embedded in Li3NbO4 epitaxial films
著者 (8件):
Kawasoko Hideyuki
(Advanced Institute for Material Research (AIMR), Tohoku University, 2-1-1 Katahira, Aoba, Sendai 980-8577, Japan)
,
Shimizu Ryota
(Department of Chemical Science and Engineering, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro, Tokyo 152-8550, Japan)
,
Takagi Yoshitaka
(Advanced Institute for Material Research (AIMR), Tohoku University, 2-1-1 Katahira, Aoba, Sendai 980-8577, Japan)
,
Yamamoto Kuniko
(Advanced Institute for Material Research (AIMR), Tohoku University, 2-1-1 Katahira, Aoba, Sendai 980-8577, Japan)
,
Sugiyama Issei
(Department of Chemical Science and Engineering, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro, Tokyo 152-8550, Japan)
,
Shiraki Susumu
(Advanced Institute for Material Research (AIMR), Tohoku University, 2-1-1 Katahira, Aoba, Sendai 980-8577, Japan)
,
Hitosugi Taro
(Advanced Institute for Material Research (AIMR), Tohoku University, 2-1-1 Katahira, Aoba, Sendai 980-8577, Japan)
,
Hitosugi Taro
(Department of Chemical Science and Engineering, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro, Tokyo 152-8550, Japan)
資料名:
Thin Solid Films
(Thin Solid Films)
巻:
621
ページ:
202-206
発行年:
2017年
JST資料番号:
B0899A
ISSN:
0040-6090
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)