文献
J-GLOBAL ID:201702219880973364
整理番号:17A0310503
ナノリソグラフィーへの応用のための熱応答性光相変化材料を用いた超解像近接場構造の設計原理【Powered by NICT】
Design principle of super resolution near-field structure using thermally responsive optical phase change materials for nanolithography applications
著者 (6件):
Park Gwanwoo
(School of Mechanical Engineering, Korea University, 145 Anam-ro, Seongbuk-gu, Seoul 136-713, Republic of Korea)
,
Lee Jinhyung
(School of Mechanical Engineering, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul 120-749, Republic of Korea)
,
Kang Sunggu
(School of Mechanical Engineering, Korea University, 145 Anam-ro, Seongbuk-gu, Seoul 136-713, Republic of Korea)
,
Kim Minsoo
(School of Mechanical Engineering, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul 120-749, Republic of Korea)
,
Kang Shinill
(School of Mechanical Engineering, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul 120-749, Republic of Korea)
,
Choi Wonjoon
(School of Mechanical Engineering, Korea University, 145 Anam-ro, Seongbuk-gu, Seoul 136-713, Republic of Korea)
資料名:
Materials & Design
(Materials & Design)
巻:
102
ページ:
45-55
発行年:
2016年07月15日
JST資料番号:
A0495B
ISSN:
0264-1275
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
イギリス (GBR)
言語:
英語 (EN)