文献
J-GLOBAL ID:201702220016641827
整理番号:17A0279998
Fe変調ドープと無作為にドープされたGaNバッファを持つサファイア上に成長させたGaN/AlGaN/AlN/GaNH EMTの比較:材料成長と素子作製【Powered by NICT】
Comparison of GaN/AlGaN/AIN/GaN HEMTs Grown on Sapphire with Fe-Modulation-Doped and Unintentionally Doped GaN Buffer: Material Growth and Device Fabrication
著者 (7件):
Gong Jiamin
(School of Electronic Engineering,Xi’an University of Posts and Telecommunications)
,
Wang Quan
(School of Electronic Engineering,Xi’an University of Posts and Telecommunications)
,
Yan Junda
(Institute of Semiconductors,Chinese Academy of Sciences)
,
Liu Fengqi
(Institute of Semiconductors,Chinese Academy of Sciences)
,
Feng Chun
(Institute of Semiconductors,Chinese Academy of Sciences)
,
Wang Xiaoliang
(Institute of Semiconductors,Chinese Academy of Sciences)
,
Wang Zhanguo
(Institute of Semiconductors,Chinese Academy of Sciences)
資料名:
Chinese Physics Letters
(Chinese Physics Letters)
巻:
33
号:
11
ページ:
117303-1-117303-5
発行年:
2016年
JST資料番号:
W1191A
ISSN:
0256-307X
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
中国 (CHN)
言語:
英語 (EN)