文献
J-GLOBAL ID:201702220635757497
整理番号:17A0513659
金ナノ粒子上に超薄酸化ケイ素膜を形成させるための乾燥プロセス
A dry process for forming ultrathin silicon oxide film on gold nanoparticle
著者 (4件):
Akita Atsunobu
(Department of Applied Chemistry, School of Science and Engineering, Kindai University, 3-4-1, Kowakae, Higashi-Osaka, Osaka 577-8502, Japan)
,
Fujiwara Keigo
(Department of Applied Chemistry, School of Science and Engineering, Kindai University, 3-4-1, Kowakae, Higashi-Osaka, Osaka 577-8502, Japan)
,
Fujishima Musashi
(Department of Applied Chemistry, School of Science and Engineering, Kindai University, 3-4-1, Kowakae, Higashi-Osaka, Osaka 577-8502, Japan)
,
Tada Hiroaki
(Department of Applied Chemistry, School of Science and Engineering, Kindai University, 3-4-1, Kowakae, Higashi-Osaka, Osaka 577-8502, Japan)
資料名:
Applied Physics Letters
(Applied Physics Letters)
巻:
110
号:
14
ページ:
143108-143108-4
発行年:
2017年04月03日
JST資料番号:
H0613A
ISSN:
0003-6951
CODEN:
APPLAB
資料種別:
逐次刊行物 (A)
記事区分:
短報
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)