文献
J-GLOBAL ID:201702221756664296
整理番号:17A0443955
SiO_x:H/bi SiN_x H/SiO_xの応用:ナノワイヤでテクスチャ化した結晶シリコン太陽電池のシリコンナノ結晶を埋込んだH積層被覆【Powered by NICT】
Application of SiOx:H/bi-SiNx:H/SiOx:H stacked coatings embedded by silicon nanocrystals on crystalline silicon solar cells with nanowire texturing
著者 (8件):
Ma Xiao-Bo
(Material Physics and Chemistry Research Center, School of Physics and Nuclear Energy Engineering, Beihang University, Beijing 100191, PR China)
,
Zhang Wei-Jia
(Material Physics and Chemistry Research Center, School of Physics and Nuclear Energy Engineering, Beihang University, Beijing 100191, PR China)
,
Zhang Wei
(Inner Mongolia Junzheng Energy & Chemical group Co., Ltd., Wuhai 016000, PR China)
,
Ma Qiang
(Material Physics and Chemistry Research Center, School of Physics and Nuclear Energy Engineering, Beihang University, Beijing 100191, PR China)
,
Fan Zhi-Qiang
(Material Physics and Chemistry Research Center, School of Physics and Nuclear Energy Engineering, Beihang University, Beijing 100191, PR China)
,
Ma Deng-Hao
(Material Physics and Chemistry Research Center, School of Physics and Nuclear Energy Engineering, Beihang University, Beijing 100191, PR China)
,
Jiang Zhao-Yi
(Material Physics and Chemistry Research Center, School of Physics and Nuclear Energy Engineering, Beihang University, Beijing 100191, PR China)
,
Zhang Yu-Long
(Material Physics and Chemistry Research Center, School of Physics and Nuclear Energy Engineering, Beihang University, Beijing 100191, PR China)
資料名:
Thin Solid Films
(Thin Solid Films)
巻:
624
ページ:
21-28
発行年:
2017年
JST資料番号:
B0899A
ISSN:
0040-6090
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)