文献
J-GLOBAL ID:201702223304529777
整理番号:17A0343869
水素アニーリングにおけるシリコンベース導波路表面平滑化のミクロ機構【Powered by NICT】
Micro-Mechanism of Silicon-Based Waveguide Surface Smoothing in Hydrogen Annealing
著者 (8件):
Duan Qianqian
(Micro Nano System Research Center, College of Information Engineering, Taiyuan University of Technology)
,
Ren Xinyu
(Micro Nano System Research Center, College of Information Engineering, Taiyuan University of Technology)
,
Jian Aoqun
(Micro Nano System Research Center, College of Information Engineering, Taiyuan University of Technology)
,
Zhang Hui
(Micro Nano System Research Center, College of Information Engineering, Taiyuan University of Technology)
,
Ji Jianlong
(Micro Nano System Research Center, College of Information Engineering, Taiyuan University of Technology)
,
Zhang Qiang
(Micro Nano System Research Center, College of Information Engineering, Taiyuan University of Technology)
,
Zhang Wendong
(Micro Nano System Research Center, College of Information Engineering, Taiyuan University of Technology)
,
Sang Shengbo
(Micro Nano System Research Center, College of Information Engineering, Taiyuan University of Technology)
資料名:
Chinese Physics Letters
(Chinese Physics Letters)
巻:
33
号:
12
ページ:
126801-1-126801-5
発行年:
2016年
JST資料番号:
W1191A
ISSN:
0256-307X
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
中国 (CHN)
言語:
英語 (EN)