文献
J-GLOBAL ID:201702224101034890
整理番号:17A0697418
パルスレーザー堆積法により成長させたエピタキシャルCuFeO_2とCuFe_1 xGa_xO_2デラフォサイト薄膜の構造及び光学特性の比較研究【Powered by NICT】
Comparative study of the structural and optical properties of epitaxial CuFeO2 and CuFe1-xGaxO2 delafossite thin films grown by pulsed laser deposition methods
著者 (8件):
Wheatley R.A.
(Instituto de Fisica, Pontificia Universidad Catolica de Chile, Av. Vicuna Mackenna 4860, Macul, Santiago, Chile)
,
Rojas S.
(Instituto de Fisica, Pontificia Universidad Catolica de Chile, Av. Vicuna Mackenna 4860, Macul, Santiago, Chile)
,
Oppolzer C.
(Instituto de Fisica, Pontificia Universidad Catolica de Chile, Av. Vicuna Mackenna 4860, Macul, Santiago, Chile)
,
Joshi T.
(Department of Physics and Astronomy, West Virginia University, Morgantown, WV 26506-6315, USA)
,
Borisov P.
(Department of Physics and Astronomy, West Virginia University, Morgantown, WV 26506-6315, USA)
,
Lederman D.
(Department of Physics and Astronomy, West Virginia University, Morgantown, WV 26506-6315, USA)
,
Lederman D.
(Department of Physics, University of California, Santa Cruz, CA 95064, USA)
,
Cabrera A.L.
(Instituto de Fisica, Pontificia Universidad Catolica de Chile, Av. Vicuna Mackenna 4860, Macul, Santiago, Chile)
資料名:
Thin Solid Films
(Thin Solid Films)
巻:
626
ページ:
110-116
発行年:
2017年
JST資料番号:
B0899A
ISSN:
0040-6090
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)