文献
J-GLOBAL ID:201702224602061742
整理番号:17A1482915
エキシマレーザアニーリングによるpolydihydrosilane結晶化の解析【Powered by NICT】
Analysis of polydihydrosilane crystallization by excimer laser annealing
著者 (4件):
Trifunovic Miki
(Department of Electronic Components, Technology and Materials, Delft University of Technology, Feldmannweg 17, 2628CT Delft, The Netherlands)
,
Sberna Paolo Maria
(Department of Electronic Components, Technology and Materials, Delft University of Technology, Feldmannweg 17, 2628CT Delft, The Netherlands)
,
Shimoda Tatsuya
(School of Materials Science, Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan)
,
Ishihara Ryoichi
(Department of Electronic Components, Technology and Materials, Delft University of Technology, Feldmannweg 17, 2628CT Delft, The Netherlands)
資料名:
Thin Solid Films
(Thin Solid Films)
巻:
638
ページ:
73-80
発行年:
2017年
JST資料番号:
B0899A
ISSN:
0040-6090
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)