文献
J-GLOBAL ID:201702225592875348
整理番号:17A1060595
自己集合ナノ球リソグラフィーにより作製したナノ構造シリコンにおける吸収促進【Powered by NICT】
Absorption enhancement in nanostructured silicon fabricated by self-assembled nanosphere lithography
著者 (9件):
Li Qiang
(Key Laboratory of Optical System Advanced Manufacturing Technology, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun, 130033, China)
,
Li Qiang
(University of the Chinese Academy of Sciences, Beijing, 100039, China)
,
Gao Jinsong
(Key Laboratory of Optical System Advanced Manufacturing Technology, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun, 130033, China)
,
Gao Jinsong
(University of the Chinese Academy of Sciences, Beijing, 100039, China)
,
Li Zizheng
(Key Laboratory of Optical System Advanced Manufacturing Technology, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun, 130033, China)
,
Yang Haigui
(Key Laboratory of Optical System Advanced Manufacturing Technology, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun, 130033, China)
,
Liu Hai
(Key Laboratory of Optical System Advanced Manufacturing Technology, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun, 130033, China)
,
Wang Xiaoyi
(Key Laboratory of Optical System Advanced Manufacturing Technology, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun, 130033, China)
,
Li Yudong
(Key Laboratory of Optical System Advanced Manufacturing Technology, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun, 130033, China)
資料名:
Optical Materials
(Optical Materials)
巻:
70
ページ:
165-170
発行年:
2017年
JST資料番号:
W0468A
ISSN:
0925-3467
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)