文献
J-GLOBAL ID:201702225693671199
整理番号:17A0934968
プラズマ増強化学蒸着プロセスにおける気体および固体原料の同時給与によるナノ粒子を包埋した薄膜の作製【Powered by NICT】
Preparation of nanoparticle-embedded thin films by simultaneous feeding of gaseous and solid raw materials in plasma-enhanced chemical vapor deposition process
著者 (3件):
Kubo Masaru
(Department of Chemical Engineering, Graduate School of Engineering, Hiroshima University, 1-4-1, Kagamiyama, Higashi-Hiroshima, Hiroshima 739-8527, Japan)
,
Taguchi Tomoya
(Department of Chemical Engineering, Graduate School of Engineering, Hiroshima University, 1-4-1, Kagamiyama, Higashi-Hiroshima, Hiroshima 739-8527, Japan)
,
Shimada Manabu
(Department of Chemical Engineering, Graduate School of Engineering, Hiroshima University, 1-4-1, Kagamiyama, Higashi-Hiroshima, Hiroshima 739-8527, Japan)
資料名:
Thin Solid Films
(Thin Solid Films)
巻:
632
ページ:
55-65
発行年:
2017年
JST資料番号:
B0899A
ISSN:
0040-6090
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)