文献
J-GLOBAL ID:201702225999110260
整理番号:17A0222819
SixGe1-x(001)とSixGe1-x(110)上のSiNxの界面拡散障壁の低温熱ALDと界面保護層
Low temperature thermal ALD of a SiNx interfacial diffusion barrier and interface passivation layer on SixGe1- x(001) and SixGe1- x(110)
著者 (14件):
Edmonds Mary
(Materials Science and Engineering Program, University of California, San Diego, La Jolla, California 92093, USA)
,
Sardashti Kasra
(Materials Science and Engineering Program, University of California, San Diego, La Jolla, California 92093, USA)
,
Wolf Steven
(Materials Science and Engineering Program, University of California, San Diego, La Jolla, California 92093, USA)
,
Chagarov Evgueni
(Department of Chemistry and Biochemistry, University of California, San Diego, La Jolla, California 92093, USA)
,
Clemons Max
(Department of Electrical and Computer Engineering, University of California, San Diego, La Jolla, California 92093, USA)
,
Kent Tyler
(Materials Science and Engineering Program, University of California, San Diego, La Jolla, California 92093, USA)
,
Park Jun Hong
(Materials Science and Engineering Program, University of California, San Diego, La Jolla, California 92093, USA)
,
Tang Kechao
(Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, USA)
,
McIntyre Paul C.
(Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, USA)
,
Yoshida Naomi
(Applied Materials, Sunnyvale, California 94085, USA)
,
Dong Lin
(Applied Materials, Sunnyvale, California 94085, USA)
,
Holmes Russell
(Rasirc, Inc., San Diego, California 92126, USA)
,
Alvarez Daniel
(Rasirc, Inc., San Diego, California 92126, USA)
,
Kummel Andrew C.
(Materials Science and Engineering Program, University of California, San Diego, La Jolla, California 92093, USA)
資料名:
Journal of Chemical Physics
(Journal of Chemical Physics)
巻:
146
号:
5
ページ:
052820-052820-12
発行年:
2017年02月07日
JST資料番号:
C0275A
ISSN:
0021-9606
CODEN:
JCPSA6
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)