文献
J-GLOBAL ID:201702226974970958
整理番号:17A0445221
硫化自由アニーリングによる新しい浴におけるCu_2ZnSnS_4薄膜の一段階電着【Powered by NICT】
One step electrodeposition of Cu2ZnSnS4 thin films in a novel bath with sulfurization free annealing
著者 (6件):
Tang Aiyue
(State Key Laboratory of Chemical Resource Engineering, Beijing Key Laboratory of Electrochemical Process and Technology for Materials, Beijing University of Chemical Technology, Beijing 100029, PR China)
,
Li Zhilin
(State Key Laboratory of Chemical Resource Engineering, Beijing Key Laboratory of Electrochemical Process and Technology for Materials, Beijing University of Chemical Technology, Beijing 100029, PR China)
,
Wang Feng
(State Key Laboratory of Chemical Resource Engineering, Beijing Key Laboratory of Electrochemical Process and Technology for Materials, Beijing University of Chemical Technology, Beijing 100029, PR China)
,
Dou Meiling
(State Key Laboratory of Chemical Resource Engineering, Beijing Key Laboratory of Electrochemical Process and Technology for Materials, Beijing University of Chemical Technology, Beijing 100029, PR China)
,
Pan Youya
(State Key Laboratory of Chemical Resource Engineering, Beijing Key Laboratory of Electrochemical Process and Technology for Materials, Beijing University of Chemical Technology, Beijing 100029, PR China)
,
Guan Jingyu
(State Key Laboratory of Chemical Resource Engineering, Beijing Key Laboratory of Electrochemical Process and Technology for Materials, Beijing University of Chemical Technology, Beijing 100029, PR China)
資料名:
Applied Surface Science
(Applied Surface Science)
巻:
402
ページ:
70-77
発行年:
2017年
JST資料番号:
B0707B
ISSN:
0169-4332
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)