文献
J-GLOBAL ID:201702227078137367
整理番号:17A1623917
蒸着後熱アニーリングによるナノ結晶性水素化シリコン薄膜の改善された熱電特性【Powered by NICT】
Improved thermoelectric properties of nanocrystalline hydrogenated silicon thin films by post-deposition thermal annealing
著者 (9件):
Loureiro Joana
(i3N/CENIMAT, Department of Materials Science, Faculty of Science and Technology, Universidade NOVA de Lisboa, Campus de Caparica, 2829-516 Caparica, Portugal)
,
Mateus Tiago
(i3N/CENIMAT, Department of Materials Science, Faculty of Science and Technology, Universidade NOVA de Lisboa, Campus de Caparica, 2829-516 Caparica, Portugal)
,
Filonovich Sergej
(i3N/CENIMAT, Department of Materials Science, Faculty of Science and Technology, Universidade NOVA de Lisboa, Campus de Caparica, 2829-516 Caparica, Portugal)
,
Ferreira Marisa
(i3N/CENIMAT, Department of Materials Science, Faculty of Science and Technology, Universidade NOVA de Lisboa, Campus de Caparica, 2829-516 Caparica, Portugal)
,
Figueira Joana
(i3N/CENIMAT, Department of Materials Science, Faculty of Science and Technology, Universidade NOVA de Lisboa, Campus de Caparica, 2829-516 Caparica, Portugal)
,
Rodrigues Alexandra
(i3N/CENIMAT, Department of Materials Science, Faculty of Science and Technology, Universidade NOVA de Lisboa, Campus de Caparica, 2829-516 Caparica, Portugal)
,
Donovan Brian F.
(Department of Physics, United States Naval Academy, Annapolis, MD 21402, USA)
,
Hopkins Patrick E.
(Department of Mechanical and Aerospace Engineering, University of Virginia, Charlottesville, VA 22904, USA)
,
Ferreira Isabel
(i3N/CENIMAT, Department of Materials Science, Faculty of Science and Technology, Universidade NOVA de Lisboa, Campus de Caparica, 2829-516 Caparica, Portugal)
資料名:
Thin Solid Films
(Thin Solid Films)
巻:
642
ページ:
276-280
発行年:
2017年
JST資料番号:
B0899A
ISSN:
0040-6090
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)