文献
J-GLOBAL ID:201702227884319313
整理番号:17A0741312
シルセスキオキサンに基づくナノ多孔質低k誘電体膜の特性化と集積性能
Characterization and Integration Performance of Methyl Silsesquioxane-Based Nano Porous Low-k Dielectric Films
著者 (11件):
CHOI Eunmi
(Chung-Ang Univ., Seoul, KOR)
,
NAM Minwoo
(Chung-Ang Univ., Seoul, KOR)
,
KIM Areum
(Chung-Ang Univ., Seoul, KOR)
,
KANG Keunwon
(Chung-Ang Univ., Seoul, KOR)
,
ZHENG Longshou
(Chung-Ang Univ., Seoul, KOR)
,
KWON Soon Hyeong
(Chung-Ang Univ., Seoul, KOR)
,
YOON Sung Pil
(Korea Inst. Sci. and Technol., Seoul, KOR)
,
HAHN Sang June
(Chung-Ang Univ., Seoul, KOR)
,
KIM Soo-Kil
(Chung-Ang Univ., Seoul, KOR)
,
SON Hyungbin
(Chung-Ang Univ., Seoul, KOR)
,
PYO Sung Gyu
(Chung-Ang Univ., Seoul, KOR)
資料名:
Journal of Nanoscience and Nanotechnology
(Journal of Nanoscience and Nanotechnology)
巻:
16
号:
11
ページ:
11224-11228
発行年:
2016年11月
JST資料番号:
W1351A
ISSN:
1533-4880
CODEN:
JNNOAR
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)