文献
J-GLOBAL ID:201702229635752037
整理番号:17A0386072
Fe/Ti系でのTi下部層の酸化状態の,硬X線光電子分光法による研究
Hard x-ray photoemission study of oxidation states of Ti underlayer in Fe/Ti film system
著者 (7件):
Takashima Akito
(Japan Synchrotron Radiation Research Institute (JASRI), 1-1-1 Kouto, Sayo, Hyogo 679-5198, Japan)
,
Ikenaga Eiji
(Japan Synchrotron Radiation Research Institute (JASRI), 1-1-1 Kouto, Sayo, Hyogo 679-5198, Japan)
,
Muro Takayuki
(Japan Synchrotron Radiation Research Institute (JASRI), 1-1-1 Kouto, Sayo, Hyogo 679-5198, Japan)
,
Kawabata Akio
(Collaborative Research Team Green Nanoelectronics Center (GNC), National Institute of Advanced Industrial Science and Technology (AIST), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan)
,
Murakami Tomo
(Collaborative Research Team Green Nanoelectronics Center (GNC), National Institute of Advanced Industrial Science and Technology (AIST), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan)
,
Nihei Mizuhisa
(Collaborative Research Team Green Nanoelectronics Center (GNC), National Institute of Advanced Industrial Science and Technology (AIST), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan)
,
Yokoyama Naoki
(Collaborative Research Team Green Nanoelectronics Center (GNC), National Institute of Advanced Industrial Science and Technology (AIST), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan)
資料名:
Journal of Vacuum Science & Technology. A. Vacuum, Surfaces and Films
(Journal of Vacuum Science & Technology. A. Vacuum, Surfaces and Films)
巻:
35
号:
2
ページ:
021507-021507-5
発行年:
2017年03月
JST資料番号:
C0789B
ISSN:
0734-2101
CODEN:
JVTAD6
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)