文献
J-GLOBAL ID:201702229849805816
整理番号:17A1637401
先端技術プロセスのための元素キャラクタリゼーションへのEELSの応用研究【Powered by NICT】
EELS applications study in elements characterization for advanced technology process
著者 (6件):
Zhou Jiashi
(Semiconductor Manufacturing International Corporation (SMIC) Shanghai, 18 Zhangjiang Road, Shanghai, 201203, China)
,
Fan Chunyan
(Semiconductor Manufacturing International Corporation (SMIC) Shanghai, 18 Zhangjiang Road, Shanghai, 201203, China)
,
Wang Jing
(Semiconductor Manufacturing International Corporation (SMIC) Shanghai, 18 Zhangjiang Road, Shanghai, 201203, China)
,
Duan Shuqin
(Semiconductor Manufacturing International Corporation (SMIC) Shanghai, 18 Zhangjiang Road, Shanghai, 201203, China)
,
Li Ming
(Semiconductor Manufacturing International Corporation (SMIC) Shanghai, 18 Zhangjiang Road, Shanghai, 201203, China)
,
Zhang Qihua
(Semiconductor Manufacturing International Corporation (SMIC) Shanghai, 18 Zhangjiang Road, Shanghai, 201203, China)
資料名:
IEEE Conference Proceedings
(IEEE Conference Proceedings)
巻:
2017
号:
IPFA
ページ:
1-3
発行年:
2017年
JST資料番号:
W2441A
資料種別:
会議録 (C)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)