文献
J-GLOBAL ID:201702229892978120
整理番号:17A0884376
(TMDCs)原子的に薄い遷移金属二カルコゲン化物のエピタキシャル縫合と積層成長ヘテロ接合【Powered by NICT】
Epitaxial Stitching and Stacking Growth of Atomically Thin Transition-Metal Dichalcogenides (TMDCs) Heterojunctions
著者 (4件):
Chen Kun
(Department of Electronic Engineering and Materials Science and Technology Research Center, The Chinese University of Hong Kong, Shatin, N.T., Hong Kong SAR, 999077, P. R. China)
,
Wan Xi
(Department of Electronic Engineering and Materials Science and Technology Research Center, The Chinese University of Hong Kong, Shatin, N.T., Hong Kong SAR, 999077, P. R. China)
,
Wan Xi
(Engineering Research Center of IoT Technology Applications (Ministry of Education), Department of Electronic Engineering, Jiangnan University, Wuxi, Jiangsu, 214122, China)
,
Xu Jianbin
(Department of Electronic Engineering and Materials Science and Technology Research Center, The Chinese University of Hong Kong, Shatin, N.T., Hong Kong SAR, 999077, P. R. China)
資料名:
Advanced Functional Materials
(Advanced Functional Materials)
巻:
27
号:
19
ページ:
ROMBUNNO.201603884
発行年:
2017年
JST資料番号:
W1336A
ISSN:
1616-301X
CODEN:
AFMDC6
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
ドイツ (DEU)
言語:
英語 (EN)