文献
J-GLOBAL ID:201702229974337630
整理番号:17A0363880
高分子基板上のグラフェン酸化物膜のレーザ直接3Dパターン形成と還元【Powered by NICT】
Laser direct 3D patterning and reduction of graphene oxide film on polymer substrate
著者 (6件):
Bobrinetskiy I.I.
(Laser Applications Centre, AIMEN, Relva 27A, 36410 Porrino, Spain)
,
Emelianov A.V.
(National Research University of Electronic Technology, bld.1, Shokin sq., Zelenograd, Moscow 124498, Russia)
,
Smagulova S.A.
(M.K. Ammosov North-Eastern Federal University, 58, Belinskii Street, Yakutsk 677000, Russia)
,
Komarov I.A.
(National Research University of Electronic Technology, bld.1, Shokin sq., Zelenograd, Moscow 124498, Russia)
,
Otero N.
(Laser Applications Centre, AIMEN, Relva 27A, 36410 Porrino, Spain)
,
Romero P.M.
(Laser Applications Centre, AIMEN, Relva 27A, 36410 Porrino, Spain)
資料名:
Materials Letters
(Materials Letters)
巻:
187
ページ:
20-23
発行年:
2017年
JST資料番号:
E0935A
ISSN:
0167-577X
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)