文献
J-GLOBAL ID:201702230230372032
整理番号:17A0765144
固相反応によるSi(111)基板上に形成したMg_2Siエピタキシャル膜の熱安定性【Powered by NICT】
Thermal stability of Mg_2Si epitaxial film formed on Si(111)substrate by solid phase reaction
著者 (11件):
Wang Xi-Na
(Institute of Physics,Chinese Academy of Sciences)
,
Wang Yong
(School of Engineering and Centre for Microscopy and Microanalysis,The University of Queensland)
,
Zou Jin
(School of Engineering and Centre for Microscopy and Microanalysis,The University of Queensland)
,
Zhang Tian-Chong
(Institute of Physics,Chinese Academy of Sciences)
,
Mei Zeng-xia
(Institute of Physics,Chinese Academy of Sciences)
,
Guo Yang
(Institute of Physics,Chinese Academy of Sciences)
,
Xue Qi-Kun
(Institute of Physics,Chinese Academy of Sciences)
,
Du Xiao-Long
(Institute of Physics,Chinese Academy of Sciences)
,
Zhang Xiao-Na
(Beijing University of Technology)
,
Han Xiao-Dong
(Beijing University of Technology)
,
Zhang Ze
(Beijing University of Technology)
資料名:
Chinese Physics B
(Chinese Physics B)
巻:
18
号:
7
ページ:
3079-3083
発行年:
2009年07月
JST資料番号:
W1539A
ISSN:
1674-1056
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
中国 (CHN)
言語:
英語 (EN)