文献
J-GLOBAL ID:201702230601256287
整理番号:17A1501794
単発,パルス幅依存性超高速レーザアブレーションによって研究した非晶質Si膜における高密度電子-正孔プラズマにおける電子-イオン結合と両極性拡散【Powered by NICT】
Electron-ion coupling and ambipolar diffusion in dense electron-hole plasma in thin amorphous Si films studied by single-shot, pulse-width dependent ultrafast laser ablation
著者 (11件):
Danilov Pavel
(Lebedev Physical Institute, 119991 Moscow, Russia)
,
Ionin Andrey
(Lebedev Physical Institute, 119991 Moscow, Russia)
,
Khmelnitskii Roman
(Lebedev Physical Institute, 119991 Moscow, Russia)
,
Kiseleva Irina
(Moscow Institute of Physics and Technology (National University), 141701 Dolgoprudny, Russia)
,
Kudryashov Sergey
(Lebedev Physical Institute, 119991 Moscow, Russia)
,
Kudryashov Sergey
(ITMO University, 197101 St. Petersburg, Russia)
,
Kudryashov Sergey
(National Research Nuclear University MEPhI (Moscow Engineering Physics Institute), 115409 Moscow, Russia)
,
Mel’nik Nikolay
(Lebedev Physical Institute, 119991 Moscow, Russia)
,
Rudenko Andrey
(Lebedev Physical Institute, 119991 Moscow, Russia)
,
Smirnov Nikita
(Lebedev Physical Institute, 119991 Moscow, Russia)
,
Zayarny Dmitry
(Lebedev Physical Institute, 119991 Moscow, Russia)
資料名:
Applied Surface Science
(Applied Surface Science)
巻:
425
ページ:
170-175
発行年:
2017年
JST資料番号:
B0707B
ISSN:
0169-4332
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)