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J-GLOBAL ID:201702230812019214   整理番号:17A0214252

分離したバルクフィン上の完全に金属ソースとドレイン形成により可能になった超低寄生抵抗とFOI FinFET【Powered by NICT】

FOI FinFET with ultra-low parasitic resistance enabled by fully metallic source and drain formation on isolated bulk-fin
著者 (27件):
Zhang Qingzhu
(Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences (IMECAS), Beijing, 100029, China)
Yin Huaxiang
(Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences (IMECAS), Beijing, 100029, China)
Luo Jun
(Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences (IMECAS), Beijing, 100029, China)
Yang Hong
(Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences (IMECAS), Beijing, 100029, China)
Meng Lingkuan
(Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences (IMECAS), Beijing, 100029, China)
Li Yudong
(Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences (IMECAS), Beijing, 100029, China)
Wu Zhenhua
(Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences (IMECAS), Beijing, 100029, China)
Zhang Yanbo
(Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences (IMECAS), Beijing, 100029, China)
Zhang Yongkui
(Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences (IMECAS), Beijing, 100029, China)
Qin Changliang
(Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences (IMECAS), Beijing, 100029, China)
Li Junjie
(Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences (IMECAS), Beijing, 100029, China)
Gao Jianfeng
(Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences (IMECAS), Beijing, 100029, China)
Wang Guilei
(Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences (IMECAS), Beijing, 100029, China)
Xiong Wenjuan
(Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences (IMECAS), Beijing, 100029, China)
Xiang Jinjuan
(Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences (IMECAS), Beijing, 100029, China)
Zhou Zhangyu
(Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences (IMECAS), Beijing, 100029, China)
Mao Shujian
(Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences (IMECAS), Beijing, 100029, China)
Xu Gaobo
(Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences (IMECAS), Beijing, 100029, China)
Liu Jinbiao
(Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences (IMECAS), Beijing, 100029, China)
Qu Yang
(Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences (IMECAS), Beijing, 100029, China)
Yang Tao
(Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences (IMECAS), Beijing, 100029, China)
Li Junfeng
(Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences (IMECAS), Beijing, 100029, China)
Xu Qiuxia
(Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences (IMECAS), Beijing, 100029, China)
Yan Jiang
(Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences (IMECAS), Beijing, 100029, China)
Zhu Huilong
(Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences (IMECAS), Beijing, 100029, China)
Zhao Chao
(Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences (IMECAS), Beijing, 100029, China)
Ye Tianchun
(Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences (IMECAS), Beijing, 100029, China)

資料名:
IEEE Conference Proceedings  (IEEE Conference Proceedings)

巻: 2016  号: IEDM  ページ: 17.3.1-17.3.4  発行年: 2016年 
JST資料番号: W2441A  資料種別: 会議録 (C)
記事区分: 原著論文  発行国: アメリカ合衆国 (USA)  言語: 英語 (EN)
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