文献
J-GLOBAL ID:201702230941340846
整理番号:17A1646262
3次元CMOSイメージセンサのための垂直薄膜ポリSiチャネル転送ゲート構造画素のエピタキシャル成長と拡散特性解析【Powered by NICT】
Epitaxial growth and diffusion characteristics analysis of vertical thin poly-Si channel transfer gate structured pixels for 3D CMOS image sensor
著者 (11件):
Park Sung-Kun
(SK hynix, CIS Development Group, Pixel Development Team, 2091 Gyeongchung-daero, Bubal-eub, Icheon-si, Gyeonggi-do, 17336, Korea)
,
Woo Donghyun
(SK hynix, CIS Development Group, Pixel Development Team, 2091 Gyeongchung-daero, Bubal-eub, Icheon-si, Gyeonggi-do, 17336, Korea)
,
Na Min-Ki
(SK hynix, CIS Development Group, Pixel Development Team, 2091 Gyeongchung-daero, Bubal-eub, Icheon-si, Gyeonggi-do, 17336, Korea)
,
Kwag Pyong-Su
(SK hynix, CIS Development Group, Pixel Development Team, 2091 Gyeongchung-daero, Bubal-eub, Icheon-si, Gyeonggi-do, 17336, Korea)
,
Lee Ho-Ryeong
(SK hynix, CIS Development Group, Pixel Development Team, 2091 Gyeongchung-daero, Bubal-eub, Icheon-si, Gyeonggi-do, 17336, Korea)
,
Ro Kyoung-Wook
(SK hynix, CIS Development Group, Process Development Team, 2091 Gyeongchung-daero, Bubal-eub, Icheon-si, Gyeonggi-do, 17336, Korea)
,
Kim Kyung-Hwan
(SK hynix, CIS Development Group, Process Development Team, 2091 Gyeongchung-daero, Bubal-eub, Icheon-si, Gyeonggi-do, 17336, Korea)
,
Lee Dong-Kyu
(SK hynix, CIS Development Group, AT Group, 2091 Gyeongchung-daero, Bubal-eub, Icheon-si, Gyeonggi-do, 17336, Korea)
,
Hong Chris
(SK hynix, CIS Development Group, Pixel Development Team, 2091 Gyeongchung-daero, Bubal-eub, Icheon-si, Gyeonggi-do, 17336, Korea)
,
Cho In-Wook
(SK hynix, CIS Development Group, Pixel Development Team, 2091 Gyeongchung-daero, Bubal-eub, Icheon-si, Gyeonggi-do, 17336, Korea)
,
Yoo Kyung-Dong
(Hanyang University, 04763, Wangsimni Road, Seongdong-gu, Seoul, 222, Korea)
資料名:
IEEE Conference Proceedings
(IEEE Conference Proceedings)
巻:
2017
号:
ESSDERC
ページ:
220-223
発行年:
2017年
JST資料番号:
W2441A
資料種別:
会議録 (C)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)