文献
J-GLOBAL ID:201702231166006595
整理番号:17A0644069
一様な周期的ナノ構造形成のためのLloyd’s干渉リソグラフィシステムにおける屈折式ビーム整形の採用
Employing refractive beam shaping in a Lloyd’s interference lithography system for uniform periodic nanostructure formation
著者 (5件):
Hung Yung-Jr
(Department of Photonics, National Sun Yat-sen University, No. 70, Lienhai Rd., Kaohsiung 804, Taiwan)
,
Chang Han-Jung
(Department of Photonics, National Sun Yat-sen University, No. 70, Lienhai Rd., Kaohsiung 804, Taiwan)
,
Chang Ping-Chien
(Department of Photonics, National Sun Yat-sen University, No. 70, Lienhai Rd., Kaohsiung 804, Taiwan)
,
Lin Jia-Jin
(Department of Photonics, National Sun Yat-sen University, No. 70, Lienhai Rd., Kaohsiung 804, Taiwan)
,
Kao Tzu-Chieh
(Department of Photonics, National Sun Yat-sen University, No. 70, Lienhai Rd., Kaohsiung 804, Taiwan)
資料名:
Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
(Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena)
巻:
35
号:
3
ページ:
030601-030601-9
発行年:
2017年05月
JST資料番号:
E0974A
ISSN:
2166-2746
CODEN:
JVTBD9
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)