文献
J-GLOBAL ID:201702231502280455
整理番号:17A0855701
Cuイオン注入の影響とポストアニーリング超ナノ結晶ダイヤモンドにおける表面形態と電界放出【Powered by NICT】
The effect of Cu ion implantation and post-annealing on surface morphology and electron field emission in ultrananocrystalline diamond
著者 (10件):
Shen Yanyan
(Research Institute of Surface Engineering, Taiyuan University of Technology, Taiyuan, PR China)
,
Zhang Yixin
(Research Institute of Surface Engineering, Taiyuan University of Technology, Taiyuan, PR China)
,
Zhang Chao
(Material & Industrial Technology Research Institute, Beijing, PR China)
,
Hei Hongjun
(Research Institute of Surface Engineering, Taiyuan University of Technology, Taiyuan, PR China)
,
Qi Ting
(Research Institute of Surface Engineering, Taiyuan University of Technology, Taiyuan, PR China)
,
Yu Sheng Wang
(Research Institute of Surface Engineering, Taiyuan University of Technology, Taiyuan, PR China)
,
He Zhiyong
(Research Institute of Surface Engineering, Taiyuan University of Technology, Taiyuan, PR China)
,
Jia Yuxin
(Research Institute of Surface Engineering, Taiyuan University of Technology, Taiyuan, PR China)
,
Ma Genwang
(Research Institute of Surface Engineering, Taiyuan University of Technology, Taiyuan, PR China)
,
Dong Lijuan
(Shanxi Provincial Key Laboratory of Electromagnetic Functional Materials for Microstructure, Shanxi Datong University, PR China)
資料名:
Journal of Alloys and Compounds
(Journal of Alloys and Compounds)
巻:
709
ページ:
8-15
発行年:
2017年
JST資料番号:
D0083A
ISSN:
0925-8388
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)