文献
J-GLOBAL ID:201702232004067002
整理番号:17A1121764
グラフェン酸化物とシリカとの間のHamaker定数を測定するための原子的に薄い「真空スペーサ」の模倣【Powered by NICT】
Mimicking an Atomically Thin “Vacuum Spacer” to Measure the Hamaker Constant between Graphene Oxide and Silica
著者 (9件):
Chu Liangyong
(Department of Chemical Engineering, Organic Materials & Interface (OMI), Delft University of Technology, Julianalaan 136, 2628, BL, Delft, The Netherlands)
,
Korobko Alexander V.
(Department of Chemical Engineering, Organic Materials & Interface (OMI), Delft University of Technology, Julianalaan 136, 2628, BL, Delft, The Netherlands)
,
Cao Anping
(Department of Chemical Engineering, Organic Materials & Interface (OMI), Delft University of Technology, Julianalaan 136, 2628, BL, Delft, The Netherlands)
,
Sachdeva Sumit
(Department of Chemical Engineering, Organic Materials & Interface (OMI), Delft University of Technology, Julianalaan 136, 2628, BL, Delft, The Netherlands)
,
Liu Zhen
(Department of Chemical Engineering, Organic Materials & Interface (OMI), Delft University of Technology, Julianalaan 136, 2628, BL, Delft, The Netherlands)
,
de Smet Louis C. P. M.
(Department of Chemical Engineering, Organic Materials & Interface (OMI), Delft University of Technology, Julianalaan 136, 2628, BL, Delft, The Netherlands)
,
Sudholter Ernst J. R.
(Department of Chemical Engineering, Organic Materials & Interface (OMI), Delft University of Technology, Julianalaan 136, 2628, BL, Delft, The Netherlands)
,
Picken Stephen J.
(Department of Chemical Engineering, Organic Materials & Interface (OMI), Delft University of Technology, Julianalaan 136, 2628, BL, Delft, The Netherlands)
,
Besseling Nicolaas A. M.
(Department of Chemical Engineering, Organic Materials & Interface (OMI), Delft University of Technology, Julianalaan 136, 2628, BL, Delft, The Netherlands)
資料名:
Advanced Materials Interfaces
(Advanced Materials Interfaces)
巻:
4
号:
5
ページ:
null
発行年:
2017年
JST資料番号:
W2484A
ISSN:
2196-7350
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)