文献
J-GLOBAL ID:201702233321488144
整理番号:17A1455177
Pd(111)上のV_2O_5の化学量論的膜の堆積と特性評価【Powered by NICT】
Deposition and characterization of stoichiometric films of V2O5 on Pd(111)
著者 (4件):
Feng Xu
(Department of Chemistry, University of Illinois at Chicago, 845 West Taylor Street, Chicago, IL 60607, United States)
,
Abdel-Rahman Mohammed K.
(Department of Chemistry, University of Illinois at Chicago, 845 West Taylor Street, Chicago, IL 60607, United States)
,
Kruppe Christopher M.
(Department of Chemistry, University of Illinois at Chicago, 845 West Taylor Street, Chicago, IL 60607, United States)
,
Trenary Michael
(Department of Chemistry, University of Illinois at Chicago, 845 West Taylor Street, Chicago, IL 60607, United States)
資料名:
Surface Science
(Surface Science)
巻:
664
ページ:
1-7
発行年:
2017年
JST資料番号:
C0129B
ISSN:
0039-6028
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)