文献
J-GLOBAL ID:201702233538549865
整理番号:17A0884377
遷移金属ジカルコゲン化物MoS_2電界効果トランジスタにおけるキャリア移動度の解析【Powered by NICT】
Analyzing the Carrier Mobility in Transition-Metal Dichalcogenide MoS2 Field-Effect Transistors
著者 (8件):
Yu Zhihao
(National Laboratory of Solid State Microstructures, School of Electronic Science and Engineering and Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, 210093, P. R. China)
,
Ong Zhun-Yong
(Institute of High Performance Computing, 1 Fusionopolis Way, 138632, Singapore)
,
Li Songlin
(National Laboratory of Solid State Microstructures, School of Electronic Science and Engineering and Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, 210093, P. R. China)
,
Xu Jian-Bin
(Department of Electronic Engineering and Materials Science and Technology Research Center, The Chinese University of Hong Kong, Hong Kong SAR, P. R. China)
,
Zhang Gang
(Institute of High Performance Computing, 1 Fusionopolis Way, 138632, Singapore)
,
Zhang Yong-Wei
(Institute of High Performance Computing, 1 Fusionopolis Way, 138632, Singapore)
,
Shi Yi
(National Laboratory of Solid State Microstructures, School of Electronic Science and Engineering and Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, 210093, P. R. China)
,
Wang Xinran
(National Laboratory of Solid State Microstructures, School of Electronic Science and Engineering and Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, 210093, P. R. China)
資料名:
Advanced Functional Materials
(Advanced Functional Materials)
巻:
27
号:
19
ページ:
ROMBUNNO.201604093
発行年:
2017年
JST資料番号:
W1336A
ISSN:
1616-301X
CODEN:
AFMDC6
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
ドイツ (DEU)
言語:
英語 (EN)