文献
J-GLOBAL ID:201702234509788035
整理番号:17A1457568
マルチマグネトロンスパッタリング装置により蒸着したHfO_2~-TiO_2薄膜複合材料の諸性質の研究【Powered by NICT】
Investigation of various properties of HfO2-TiO2 thin film composites deposited by multi-magnetron sputtering system
著者 (6件):
Mazur M.
(Wroclaw University of Technology, Faculty of Microsystem Electronics and Photonics, Janiszewskiego 11/17, 50-372 Wroclaw, Poland)
,
Poniedzialek A.
(Wroclaw University of Technology, Faculty of Microsystem Electronics and Photonics, Janiszewskiego 11/17, 50-372 Wroclaw, Poland)
,
Kaczmarek D.
(Wroclaw University of Technology, Faculty of Microsystem Electronics and Photonics, Janiszewskiego 11/17, 50-372 Wroclaw, Poland)
,
Wojcieszak D.
(Wroclaw University of Technology, Faculty of Microsystem Electronics and Photonics, Janiszewskiego 11/17, 50-372 Wroclaw, Poland)
,
Domaradzki J.
(Wroclaw University of Technology, Faculty of Microsystem Electronics and Photonics, Janiszewskiego 11/17, 50-372 Wroclaw, Poland)
,
Gibson D.
(Institute of Thin Films, Sensors & Imaging, University of the West of Scotland, Scottish Universities Physics Alliance, High Street, Paisley PA1 2BE, United Kingdom)
資料名:
Applied Surface Science
(Applied Surface Science)
巻:
421
号:
PA
ページ:
170-178
発行年:
2017年
JST資料番号:
B0707B
ISSN:
0169-4332
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)