文献
J-GLOBAL ID:201702234629676894
整理番号:17A1057054
中性pHでのAlドープメソ多孔性シリカ(MCM 41)上に担持されたrGOαFeOOHによるフェノールの可視光光Fenton酸化:触媒の性能と最適化【Powered by NICT】
Visible-light photo-Fenton oxidation of phenol with rGO-α-FeOOH supported on Al-doped mesoporous silica (MCM-41) at neutral pH: Performance and optimization of the catalyst
著者 (5件):
Wang Ying
(The Key Laboratory of Water and Sediment Sciences, Ministry of Education, School of Environment, Beijing Normal University, Beijing 100875, PR China)
,
Liang Mingxing
(The Key Laboratory of Water and Sediment Sciences, Ministry of Education, School of Environment, Beijing Normal University, Beijing 100875, PR China)
,
Fang Jiasheng
(College of Chemical Engineering, Beijing University of Chemical Technology, Beijing 100029, PR China)
,
Fu Jun
(Sino-Japan Friendship Centre for Environmental Protection, Beijing 100029, PR China)
,
Chen Xiaochun
(College of Chemical Engineering, Beijing University of Chemical Technology, Beijing 100029, PR China)
資料名:
Chemosphere
(Chemosphere)
巻:
182
ページ:
468-476
発行年:
2017年
JST資料番号:
E0843A
ISSN:
0045-6535
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
イギリス (GBR)
言語:
英語 (EN)