文献
J-GLOBAL ID:201702234719430335
整理番号:17A0386062
磁場増強型高電力パルスマグネトロンスパッタ法による(AlTi)xN1-x薄膜の微細構造と機械的性質
Microstructure and mechanical properties of (AlTi)xN1-x films by magnetic-field-enhanced high power impulse magnetron sputtering
著者 (6件):
Tian Xiubo
(State Key Lab of Advanced Welding and Joining, Harbin Institute of Technology, Harbin 150001, China)
,
Ma Yinghe
(State Key Lab of Advanced Welding and Joining, Harbin Institute of Technology, Harbin 150001, China)
,
Hu Jian
(State Key Lab of Advanced Welding and Joining, Harbin Institute of Technology, Harbin 150001, China)
,
Bi Mingkang
(State Key Lab of Advanced Welding and Joining, Harbin Institute of Technology, Harbin 150001, China)
,
Gong Chunzhi
(State Key Lab of Advanced Welding and Joining, Harbin Institute of Technology, Harbin 150001, China)
,
Chu Paul K.
(Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong, China)
資料名:
Journal of Vacuum Science & Technology. A. Vacuum, Surfaces and Films
(Journal of Vacuum Science & Technology. A. Vacuum, Surfaces and Films)
巻:
35
号:
2
ページ:
021402-021402-6
発行年:
2017年03月
JST資料番号:
C0789B
ISSN:
0734-2101
CODEN:
JVTAD6
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)