文献
J-GLOBAL ID:201702236742952075
整理番号:17A1004523
Sillen-Aurivilliusペロブスカイトオキシハライドへの層挿入による価電子バンドエンジニアリング
Valence Band Engineering by a Layer Insertion to Sillen-Aurivillius Perovskite Oxyhalides
著者 (10件):
Kato Daichi
(Graduate School of Engineering, Kyoto University)
,
Herve Cecile
(Graduate School of Engineering, Kyoto University)
,
Herve Cecile
(IUT de Lannion, Universite de Rennes 1)
,
Yamamoto Takafumi
(Graduate School of Engineering, Kyoto University)
,
Kunioku Hironobu
(Graduate School of Engineering, Kyoto University)
,
Higashi Masanobu
(Graduate School of Engineering, Kyoto University)
,
Abe Ryu
(Graduate School of Engineering, Kyoto University)
,
Abe Ryu
(JST-CREST)
,
Kageyama Hiroshi
(Graduate School of Engineering, Kyoto University)
,
Kageyama Hiroshi
(JST-CREST)
資料名:
Chemistry Letters
(Chemistry Letters)
巻:
46
号:
8
ページ:
1083-1085(J-STAGE)
発行年:
2017年
JST資料番号:
S0742A
ISSN:
0366-7022
CODEN:
CMLTAG
資料種別:
逐次刊行物 (A)
記事区分:
短報
発行国:
日本 (JPN)
言語:
英語 (EN)