文献
J-GLOBAL ID:201702237647935166
整理番号:17A1604180
反応性電子ビームスパッタリング法により堆積したTiO2薄膜の光学的性質
Optical Properties of TiO2 Films Deposited by Reactive Electron Beam Sputtering
著者 (15件):
KRUCHININ V. N.
(Rzhanov Inst. of Semiconductor Physics, Novosibirsk, RUS)
,
PEREVALOV T. V.
(Novosibirsk State Univ., Novosibirsk, RUS)
,
ATUCHIN V. V.
(Rzhanov Inst. of Semiconductor Physics, Novosibirsk, RUS)
,
ATUCHIN V. V.
(Novosibirsk State Univ., Novosibirsk, RUS)
,
ATUCHIN V. V.
(Tomsk State Univ., Tomsk, RUS)
,
ATUCHIN V. V.
(Tyumen State Univ., Tyumen, RUS)
,
ATUCHIN V. V.
(South Ural State Univ., Chelyabinsk, RUS)
,
GRITSENKO V. A.
(Rzhanov Inst. of Semiconductor Physics, Novosibirsk, RUS)
,
GRITSENKO V. A.
(Novosibirsk State Univ., Novosibirsk, RUS)
,
KOMONOV A. I.
(Rzhanov Inst. of Semiconductor Physics, Novosibirsk, RUS)
,
KOROLKOV I. V.
(Novosibirsk State Univ., Novosibirsk, RUS)
,
KOROLKOV I. V.
(Nikolaev Inst. of Inorganic Chemistry, RAS, Novosibirsk, RUS)
,
POKROVSKY L. D.
(Rzhanov Inst. of Semiconductor Physics, Novosibirsk, RUS)
,
SHIH Cheng Wei
(National Chiao Tung Univ., Hsinchu, TWN)
,
CHIN Albert
(National Chiao Tung Univ., Hsinchu, TWN)
資料名:
Journal of Electronic Materials
(Journal of Electronic Materials)
巻:
46
号:
10
ページ:
6089-6095
発行年:
2017年10月
JST資料番号:
D0277B
ISSN:
0361-5235
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)