文献
J-GLOBAL ID:201702237923497527
整理番号:17A0402528
機械学習に基づく高速と製造に優しい光近接効果補正【Powered by NICT】
A fast and manufacture-friendly optical proximity correction based on machine learning
著者 (6件):
Ma Xu
(Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China, School of Optoelectronics, Beijing Institute of Technology, Beijing 100081, PR China)
,
Jiang Shangliang
(Department of Electrical Engineering and Computer Sciences, University of California at Berkeley, CA 94706, U.S.A)
,
Wang Jie
(Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China, School of Optoelectronics, Beijing Institute of Technology, Beijing 100081, PR China)
,
Wu Bingliang
(Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China, School of Optoelectronics, Beijing Institute of Technology, Beijing 100081, PR China)
,
Song Zhiyang
(Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China, School of Optoelectronics, Beijing Institute of Technology, Beijing 100081, PR China)
,
Li Yanqiu
(Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China, School of Optoelectronics, Beijing Institute of Technology, Beijing 100081, PR China)
資料名:
Microelectronic Engineering
(Microelectronic Engineering)
巻:
168
ページ:
15-26
発行年:
2017年
JST資料番号:
C0406B
ISSN:
0167-9317
CODEN:
MIENEF
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)