文献
J-GLOBAL ID:201702241162258926
整理番号:17A1823237
化学蒸着と原子層堆積プロセスのための反応経路解析:チタニア薄膜蒸着の研究【Powered by NICT】
Reaction path analysis for chemical vapor deposition and atomic layer deposition processes: A study of titania thin-film deposition
著者 (3件):
Salami Hossein
(Department of Chemical and Biomolecular Engineering, Institute for Systems Research, University of Maryland, College Park, MD 20742, USA)
,
Ramakrishnasubramanian Krishnaprasath
(Department of Chemical and Biomolecular Engineering, Institute for Systems Research, University of Maryland, College Park, MD 20742, USA)
,
Adomaitis Raymond A.
(Department of Chemical and Biomolecular Engineering, Institute for Systems Research, University of Maryland, College Park, MD 20742, USA)
資料名:
Physica Status Solidi. B. Basic Solid State Physics
(Physica Status Solidi. B. Basic Solid State Physics)
巻:
254
号:
10
ページ:
ROMBUNNO.201700091
発行年:
2017年
JST資料番号:
C0599A
ISSN:
0370-1972
CODEN:
PSSBBD
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)