文献
J-GLOBAL ID:201702241282300107
整理番号:17A0697830
高品質硬磁性膜の製造のためのガス流スパッタリング【Powered by NICT】
Gas flow sputtering for manufacture of high quality hard magnetic films
著者 (5件):
Bandorf R.
(Fraunhofer Institute for Surface Engineering and Thin Films IST, Bienroder Weg 54 E, 38108 Braunschweig, Germany)
,
Groninger A.
(Fraunhofer Institute for Surface Engineering and Thin Films IST, Bienroder Weg 54 E, 38108 Braunschweig, Germany)
,
Ortner K.
(Fraunhofer Institute for Surface Engineering and Thin Films IST, Bienroder Weg 54 E, 38108 Braunschweig, Germany)
,
Gerdes H.
(Fraunhofer Institute for Surface Engineering and Thin Films IST, Bienroder Weg 54 E, 38108 Braunschweig, Germany)
,
Braeuer G.
(Fraunhofer Institute for Surface Engineering and Thin Films IST, Bienroder Weg 54 E, 38108 Braunschweig, Germany)
資料名:
Surface & Coatings Technology
(Surface & Coatings Technology)
巻:
314
ページ:
92-96
発行年:
2017年
JST資料番号:
D0205C
ISSN:
0257-8972
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)