文献
J-GLOBAL ID:201702241422718552
整理番号:17A0887438
Czochralskiシリコン中の酸素析出物と転位の成長【Powered by NICT】
Growth of Oxygen Precipitates and Dislocations in Czochralski Silicon
著者 (5件):
Rougieux Fiacre E.
(Research School of Engineering, College of Engineering and Computer Science, Australian National University, Canberra, ACT, Australia)
,
Nguyen Hieu T.
(Research School of Engineering, College of Engineering and Computer Science, Australian National University, Canberra, ACT, Australia)
,
Macdonald D. H.
(Research School of Engineering, College of Engineering and Computer Science, Australian National University, Canberra, ACT, Australia)
,
Mitchell Bernhard
(School of Photovoltaic and Renewable Energy Engineering, University of New South Wales, Sydney, NSW, Australia)
,
Falster Robert
(SunEdison Semiconductor, Merano, Italy)
資料名:
IEEE Journal of Photovoltaics
(IEEE Journal of Photovoltaics)
巻:
7
号:
3
ページ:
735-740
発行年:
2017年
JST資料番号:
W2305A
ISSN:
2156-3381
CODEN:
IJPEG8
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)