文献
J-GLOBAL ID:201702241551635282
整理番号:17A0759387
パルスUVレーザ照射による反応性スパッタNiO_x薄膜の改質【Powered by NICT】
Modification of reactively sputtered NiOx thin films by pulsed UV laser irradiation
著者 (4件):
Itapu Srikanth
(Department of Electrical Engineering and Computer Science, University of Toledo, Toledo, OH, 43606, USA)
,
Georgiev Daniel G.
(Department of Electrical Engineering and Computer Science, University of Toledo, Toledo, OH, 43606, USA)
,
Uprety Prakash
(Department of Physics and Astronomy and Wright Center for Photovoltaics Innovation and Commercialization, University of Toledo, Toledo, OH, 43606, USA)
,
Podraza Nikolas J.
(Department of Physics and Astronomy and Wright Center for Photovoltaics Innovation and Commercialization, University of Toledo, Toledo, OH, 43606, USA)
資料名:
Physica Status Solidi. A. Applications and Materials Science
(Physica Status Solidi. A. Applications and Materials Science)
巻:
214
号:
2
ページ:
ROMBUNNO.201600414
発行年:
2017年
JST資料番号:
D0774A
ISSN:
1862-6300
CODEN:
PSSABA
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
ドイツ (DEU)
言語:
英語 (EN)