文献
J-GLOBAL ID:201702243675068703
整理番号:17A1090551
リソグラフィ投影レンズの熱収差解析
The thermal aberration analysis of a lithography projection lens
著者 (11件):
MAO Yanjie
(Shanghai Inst. Optics and Fine Mechanics, Chinese Acad. Sci., Shanghai, CHN)
,
MAO Yanjie
(Univ. Chinese Acad. Sci., Beijing, CHN)
,
LI Sikun
(Shanghai Inst. Optics and Fine Mechanics, Chinese Acad. Sci., Shanghai, CHN)
,
LI Sikun
(Univ. Chinese Acad. Sci., Beijing, CHN)
,
SUN Gang
(Shanghai Micro Electronic Equipment, Co, LTD, Shanghai, CHN)
,
WANG Jian
(Shanghai Micro Electronic Equipment, Co, LTD, Shanghai, CHN)
,
DUAN Lifeng
(Shanghai Micro Electronic Equipment, Co, LTD, Shanghai, CHN)
,
BU Yang
(Shanghai Inst. Optics and Fine Mechanics, Chinese Acad. Sci., Shanghai, CHN)
,
BU Yang
(Univ. Chinese Acad. Sci., Beijing, CHN)
,
WANG Xiangzhao
(Shanghai Inst. Optics and Fine Mechanics, Chinese Acad. Sci., Shanghai, CHN)
,
WANG Xiangzhao
(Univ. Chinese Acad. Sci., Beijing, CHN)
資料名:
Proceedings of SPIE
(Proceedings of SPIE)
巻:
10147
ページ:
101471P.1-101471P.9
発行年:
2017年
JST資料番号:
D0943A
ISSN:
0277-786X
CODEN:
PSISDG
資料種別:
会議録 (C)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)