文献
J-GLOBAL ID:201702243687781080
整理番号:17A0315802
光触媒TiO_2ナノ膜に及ぼす弾性歪の影響:FeNiCoTi合金基板のマルテンサイト表面レリーフの利用【Powered by NICT】
Elastic strain effects on the photocatalytic TiO2 nanofilm: Utilizing the martensitic surface relief of FeNiCoTi alloy substrate
著者 (5件):
Du Minshu
(Department of Materials Science and Engineering, China University of Petroleum at Beijing, Beijing 102249, China)
,
Du Minshu
(Center for Electrochemistry, Department of Chemistry, The University of Texas at Austin, Austin, TX 78712, United States)
,
Wan Qiong
(Department of Materials Science and Engineering, China University of Petroleum at Beijing, Beijing 102249, China)
,
Wang Zhongqiang
(Department of Materials Science and Engineering, China University of Petroleum at Beijing, Beijing 102249, China)
,
Cui Lishan
(Department of Materials Science and Engineering, China University of Petroleum at Beijing, Beijing 102249, China)
資料名:
Chemical Physics Letters
(Chemical Physics Letters)
巻:
658
ページ:
130-133
発行年:
2016年
JST資料番号:
B0824A
ISSN:
0009-2614
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)