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J-GLOBAL ID:201702244231012002
整理番号:17A0414235
高Nbドープと正常PZT薄膜の熱分解の比較【Powered by NICT】
Comparison of the Thermal Degradation of Heavily Nb-Doped and Normal PZT Thin Films
著者 (7件):
Yang Jeong-Suong
(LCR Advanced Development Team Corporate R&D Institute, Samsung Electro-Mechanics, Suwon, South Korea)
,
Kang YunSung
(LCR Advanced Development Team Corporate R&D Institute, Samsung Electro-Mechanics, Suwon, South Korea)
,
Kang Inyoung
(LCR Advanced Development Team Corporate R&D Institute, Samsung Electro-Mechanics, Suwon, South Korea)
,
Lim SeungMo
(LCR Advanced Development Team Corporate R&D Institute, Samsung Electro-Mechanics, Suwon, South Korea)
,
Shin Seung-Joo
(LCR Advanced Development Team Corporate R&D Institute, Samsung Electro-Mechanics, Suwon, South Korea)
,
Lee JungWon
(Corporate R&D Institute, Samsung Electro-Mechanics, Suwon, South Korea)
,
Hur Kang Heon
(Corporate R&D Institute, Samsung Electro-Mechanics, Suwon, South Korea)
資料名:
IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control
(IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control)
巻:
64
号:
3
ページ:
617-622
発行年:
2017年
JST資料番号:
H0369A
ISSN:
0885-3010
CODEN:
ITUCER
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)